Flow strength of tantalum under ramp compression to 250 GPa

A magnetic loading technique was used to study the strength of polycrystalline tantalum ramp compressed to peak stresses between 60 and 250 GPa. Velocimetry was used to monitor the planar ramp compression and release of various tantalum samples. A wave profile analysis was then employed to determine...

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Bibliographic Details
Published in:Journal of applied physics 2014-01, Vol.115 (4)
Main Authors: Brown, J. L., Alexander, C. S., Asay, J. R., Vogler, T. J., Dolan, D. H., Belof, J. L.
Format: Article
Language:English
Subjects:
ANNEALING
Applied physics
COMPRESSION
Compressive strength
Computer simulation
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
Fish
Longitudinal waves
MONTE CARLO METHOD
POLYCRYSTALS
PRESSURE DEPENDENCE
SHEAR PROPERTIES
Shear stress
STRAIN RATE
STRESSES
TANTALUM
UNLOADING
Velocimetry
Velocity measurement
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Summary:A magnetic loading technique was used to study the strength of polycrystalline tantalum ramp compressed to peak stresses between 60 and 250 GPa. Velocimetry was used to monitor the planar ramp compression and release of various tantalum samples. A wave profile analysis was then employed to determine the pressure-dependence of the average shear stress upon unloading at strain rates on the order of 105 s−1. Experimental uncertainties were quantified using a Monte Carlo approach, where values of 5% in the estimated pressure and 9–17% in the shear stress were calculated. The measured deviatoric response was found to be in good agreement with existing lower pressure strength data as well as several strength models. Significant deviations between the experiments and models, however, were observed at higher pressures where shear stresses of up to 5 GPa were measured. Additionally, these data suggest a significant effect of the initial material processing on the high pressure strength. Heavily worked or sputtered samples were found to support up to a 30% higher shear stress upon release than an annealed material.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.4863463