Metastable ion study of organosilicon compounds. Part XIV-trimethylsilylacetic acid, (CH3)3SiCH2COOH, and its methyl ester, (CH3)3SiCH2COOCH3

The unimolecular metastable decompositions of trimethylsilylacetic acid, (CH3)3SiCH2COOH (1), and its methyl ester, (CH3)3SiCH2COOCH3 (2), were investigated by mass‐analyzed ion kinetic energy (MIKE) spectrometry in conjunction with thermochemical data. The abundance of the molecular ions of both co...

Full description

Saved in:
Bibliographic Details
Published in:Journal of mass spectrometry. 2002-03, Vol.37 (3), p.299-304
Main Authors: Tajima, Susumu, Watanabe, Daisuke, Nakajima, Satoshi, Sekiguchi, Osamu, Nibbering, Nico M. M.
Format: Article
Language:English
Subjects:
CH2CO loss
Chemistry
Exact sciences and technology
ion-radical complex
Mass spectrometry
mass-analyzed ion kinetic energy spectrometry
Organic chemistry
organosilicon compounds
Reactivity and mechanisms
thermochemistry
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The unimolecular metastable decompositions of trimethylsilylacetic acid, (CH3)3SiCH2COOH (1), and its methyl ester, (CH3)3SiCH2COOCH3 (2), were investigated by mass‐analyzed ion kinetic energy (MIKE) spectrometry in conjunction with thermochemical data. The abundance of the molecular ions of both compounds, generated by electron ionization, is extremely low. However, the abundance of the ions generated by the loss of .CH3 and observed at m/z 117 and 131 is moderate. These fragment ions further decompose to form the most abundant m/z 75 and 89 ions, respectively, by the loss of CH2CO through a (CH3)2Si group migration. The loss of CH2CO is also observed to occur from 2+. and its fragment ion at m/z 115 generated by the loss of .OCH3. The former reaction is proposed to occur via an ion–radical complex. Copyright © 2002 John Wiley & Sons, Ltd.
ISSN:1076-5174
1096-9888
DOI:10.1002/jms.284