Electron energy distributions and plasma parameters in high-power pulsed magnetron sputtering discharges

We report on the results obtained using time-resolved Langmuir probe measurements in high-power pulsed dc magnetron sputtering discharges. Time evolutions of the electron energy distribution and the local plasma parameters were investigated at a substrate position of 100 mm from a planar target of 1...

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Bibliographic Details
Published in:Plasma sources science & technology 2009-05, Vol.18 (2), p.025008-025008 (7)
Main Authors: PAJDAROVA, A. D, VLCEK, J, KUDLACEK, P, LUKAS, J
Format: Article
Language:English
Subjects:
Applied sciences
Electric and magnetic measurements
Electronic tubes, masers
Electronics
Exact sciences and technology
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma diagnostic techniques and instrumentation
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Summary:We report on the results obtained using time-resolved Langmuir probe measurements in high-power pulsed dc magnetron sputtering discharges. Time evolutions of the electron energy distribution and the local plasma parameters were investigated at a substrate position of 100 mm from a planar target of 100 mm diameter during a high-rate deposition of copper films. The average target power density in a pulse was 500 W cm-2 at a repetition frequency of 1 kHz, a voltage pulse duration of 200 mus and an argon pressure of 1 Pa. The electron energy distributions with two energy groups and sharply truncated high-energy tails were observed during a pulse. After a fast rise in a 50 mus initial stage of the pulse, the kinetic temperature of electrons, defined using the mean electron energy, remained in the range from 10 500 to 12 200 K till the pulse termination. The temperature of weakly populated hot electrons decreased rapidly in the initial stage of the pulse approaching the kinetic temperature approximately 100 mus after a pulse initiation. High plasma densities, being in the range 1 X 1012-2 X 1012 cm-3 for 100 mus, were achieved at the substrate position with a 50 mus delay after establishing the 125 mus steady-state discharge regime with the target power density of 650-680 W cm-2 during a pulse. The plasma potential slowly increased from 0.5 to 3.5 V during the pulse and 25 mus after its termination.
ISSN:0963-0252
1361-6595
DOI:10.1088/0963-0252/18/2/025008