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Design aspects of MOS-controlled thyristor elements: technology, simulation, and experimental results

2.5-kV thyristor devices have been fabricated with integrated MOS controlled n/sup +/-emitter shorts and a bipolar turn-on gate using a p-channel DMOS technology. Square-cell geometries with pitch variations ranging from 15 to 30 mu m were implemented in one- and two-dimensional arrays with up to 20...

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Bibliographic Details
Published in:IEEE transactions on electron devices 1991-07, Vol.38 (7), p.1605-1611
Main Authors: Bauer, F., Halder, E., Hofmann, K., Haddon, H., Roggwiller, P., Stockmeier, T., Burgler, J., Fichtner, W., Muller, S., Westermann, M., Moret, J.-M., Vuilleumier, R.
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Language:English
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Summary:2.5-kV thyristor devices have been fabricated with integrated MOS controlled n/sup +/-emitter shorts and a bipolar turn-on gate using a p-channel DMOS technology. Square-cell geometries with pitch variations ranging from 15 to 30 mu m were implemented in one- and two-dimensional arrays with up to 20000 units. The impact of the cell pitch on the turn-off performance and the on-state voltage was studied for arrays with constant cathode area as well as for single-cell structures. By realizing MOS components with submicrometer channel lengths, scaled single cells are shown to turn off with current densities of several kiloamperes per square centimeter at a gate bias of 5 V. In the case of multi-cell ensembles, turn-off performance is limited due to inhomogeneous current distribution. Critical process parameters as well as the device behavior were optimized through multidimensional numerical simulation.< >
ISSN:0018-9383
1557-9646
DOI:10.1109/16.85156