Development of Photosensitive Alicyclic Polyimides Based on Reaction Development Patterning

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Bibliographic Details
Published in:Journal of Photopolymer Science and Technology 2013/06/25, Vol.26(3), pp.357-360
Main Authors: Yasuda, Megumi, Takahashi, Akio, Oyama, Toshiyuki
Format: Article
Language:English
Subjects:
Development by aqueous alkaline solution
Diazonaphthoquinone
Negative-tone reaction development patterning
Photosensitive polyimide
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ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.26.357