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Post-redox engineering electron configurations of atomic thick C3N4 nanosheets for enhanced photocatalytic hydrogen evolution

[Display omitted] •Post-redox route is a potential strategy for rationally engineering electron configurations of ultrathin C3N4.•Pleasurable PHE efficiency with high AQE surpasses most of existing C3N4-based photocatalysts.•The optimized electron configurations of mesoporous atomic thick layers boo...

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Published in:Applied catalysis. B, Environmental Environmental, 2020-08, Vol.270, p.118855, Article 118855
Main Authors: Li, Yongli, Xu, Xiangfeng, Wang, Jinshu, Luo, Wei, Zhang, Zhipeng, Cheng, Xing, Wu, Junshu, Yang, Yilong, Chen, Ge, Sun, Shaorui, Wang, Lianzhou
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Language:English
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Summary:[Display omitted] •Post-redox route is a potential strategy for rationally engineering electron configurations of ultrathin C3N4.•Pleasurable PHE efficiency with high AQE surpasses most of existing C3N4-based photocatalysts.•The optimized electron configurations of mesoporous atomic thick layers boost the photocatalytic performance. Polymeric carbon nitride (C3N4) with atomic thick layers has displayed ultrashort carrier transfer and ion/molecule migration path for enhancement of photocatalytic performance. However, rational modulation towards electron configurations of ultra-thin C3N4 nanosheets is still a challenge, because the existing exfoliation strategies suffer from uncontrollable atom-defects and edge functional groups, leading to poor solar-to-fuel conversion efficiency. Herein, a post-redox method is developed to form atomic thick C3N4 nanosheets with optimized electron configurations through liquid exfoliation and C-reduction. The as-prepared carbon-reduced atomic thick C3N4 (CRed-AT-C3N4) expose more active sites, greatly enhance charge carrier mobility and distinctly reduce the optical band gap, thus leading to a remarkably improved photocatalytic hydrogen evolution rate of 246.2 μmol h−1 under visible light irradiation (λ > 420 nm), which is 17-fold higher than that of the pristine counterpart. The apparent quantum efficiency reaches 18.52 % at 420 nm and surpasses most of existing C3N4-based photocatalysts.
ISSN:0926-3373
1873-3883
DOI:10.1016/j.apcatb.2020.118855