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Microbial Corrosion in Titanium-Based Dental Implants: How Tiny Bacteria Can Create a Big Problem?

Microbiologically induced corrosion plays a key role in implanted materials survival, especially those exposed to the oral environment. Despite considerable progress in this field, a consensus is still missing due to contradictory findings regarding the role of oral biofilms in the electrochemical b...

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Bibliographic Details
Published in:Journal of bio- and tribo-corrosion 2021-12, Vol.7 (4), Article 136
Main Authors: Costa, Raphael C., Abdo, Victoria L., Mendes, Patrícia H. C., Mota-Veloso, Isabella, Bertolini, Martinna, Mathew, Mathew T., Barão, Valentim A. R., Souza, João Gabriel S.
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Language:English
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Summary:Microbiologically induced corrosion plays a key role in implanted materials survival, especially those exposed to the oral environment. Despite considerable progress in this field, a consensus is still missing due to contradictory findings regarding the role of oral biofilms in the electrochemical behavior of titanium (Ti) implant surfaces. This scoping review comprehensively reviews and discusses the current evidence and new perspectives on microbial corrosion. The main focus is understanding oral biofilm formation and its synergistic effect under the corrosion/tribocorrosion phenomenon. We critically revisited the literature to refine key concepts and mechanisms involved in polymicrobial biofilm formation on implant devices, microbial corrosion phenomenon, and its consequence for surrounding tissues. To summarize what is currently known about this topic, we have conducted a scoping review. Data of eligible in vitro studies suggest that oral biofilm and bacterial metabolites products can affect negatively the electrochemical behavior of Ti material and promote implant surface deterioration. Relevant experimental strategies to practically approach the field of microbial corrosion mechanisms are outlined. Finally, new approaches to enhance biomaterial development should consider improved corrosion resistance to promote higher implant survival.
ISSN:2198-4220
2198-4239
DOI:10.1007/s40735-021-00575-8