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Light-assisted self-organization and pattern formation in thin films of azobenzene-containing polyurea
[Display omitted] •Azo-polyurea (Azo-PU) with azobenzene group in the main chain was synthesized.•Azo-PU shows reversible cis-trans isomerization on UV and visible light exposure.•Ordered nano-scale patterns were produced by photoinduced dewetting in azo-PU.•Pattern morphology and resolution were co...
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Published in: | Optics and laser technology 2021-11, Vol.143, p.107288, Article 107288 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | [Display omitted]
•Azo-polyurea (Azo-PU) with azobenzene group in the main chain was synthesized.•Azo-PU shows reversible cis-trans isomerization on UV and visible light exposure.•Ordered nano-scale patterns were produced by photoinduced dewetting in azo-PU.•Pattern morphology and resolution were controlled using photomask feature sizes.•Patterned azo-PU provides a favourable platform for protein adsorption.
In this work, ordered patterns having nanoscale features and resolutions in the range of 5–75 μm are produced from thin films of azo-polyurea (azo-PU) using photoinduced dewetting. Azo-PU is synthesized through polyaddition reactions, and reversible isomerization between cis – trans states is demonstrated by exposure to light of wavelengths 365 and 450 nm. This photochemical response is exploited to produce patterns by selective exposure using photomasks followed by subsequent annealing to induce polymer flow and dewetting. Marangoni flow is found to be a dominant mechanism that controls morphological evolution of patterns. The patterns can be switched between pillar-like and hole-like morphologies by stimulating the forward or backward isomerization reaction, and pattern resolution can be controlled using photomasks of different feature sizes. Preferential adsorption of proteins on these patterns is proposed as a potential application. |
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ISSN: | 0030-3992 1879-2545 |
DOI: | 10.1016/j.optlastec.2021.107288 |