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Using the Aerasense NanoTracer for simultaneously obtaining several ultrafine particle exposure metrics
The expanding production and use of nanomaterials increases the chance of human exposure to engineered nanoparticles (NP), also referred to as ultrafine particles (UFP; [< or =] 100 - 300 nm). This is particularly true in workplaces where they can become airborne and thereafter inhaled by workers...
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Published in: | Journal of physics. Conference series 2011-07, Vol.304 (1), p.012010-11 |
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Main Author: | |
Format: | Article |
Language: | English |
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Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The expanding production and use of nanomaterials increases the chance of human exposure to engineered nanoparticles (NP), also referred to as ultrafine particles (UFP; [< or =] 100 - 300 nm). This is particularly true in workplaces where they can become airborne and thereafter inhaled by workers during nanopowder processing. Considering the suspected hazard of many engineered UFPs, the general recommendation is to take measures for minimizing personal exposure while monitoring the UFP pollution for assessment and control purposes. The portable Aerasense NanoTracer accomplishes this UFP monitoring, either intermittently or in real time. This paper reviews its design and operational characteristics and elaborates on a number of application extensions and constraints. The NanoTracer's output signals enable several UFP exposure metrics to be simultaneously inferred. These include the airborne UFP number concentration and the number-averaged particle size, serving as characteristics of the pertaining UFP pollution. When non-hygroscopic particles are involved, the NanoTracer's output signals also allow an estimation of the lung-deposited UFP surface area concentration and the lung-deposited UFP mass concentration. It is thereby possible to distinguish between UFP depositions in the alveolar region, the trachea-bronchial region and the head airway region, respectively, by making use of the ICRP particle deposition model. |
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ISSN: | 1742-6596 1742-6588 1742-6596 |
DOI: | 10.1088/1742-6596/304/1/012010 |