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Layer‐by‐layer self‐assembly of polyethersulphone microfiltration membranes for dye removal and flux recovery improvement
Commercial polyethersulphone (PES) microfiltration (MF) membranes were modified with sulphuric acid, chitosan (CHS), and graphene oxide (GO) by the layer‐by‐layer self‐assembly method via electrostatic interaction using a pressurized filtration system. The sulphonation of the PES MF membranes was ac...
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Published in: | Canadian journal of chemical engineering 2022-08, Vol.100 (8), p.1920-1929 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Commercial polyethersulphone (PES) microfiltration (MF) membranes were modified with sulphuric acid, chitosan (CHS), and graphene oxide (GO) by the layer‐by‐layer self‐assembly method via electrostatic interaction using a pressurized filtration system. The sulphonation of the PES MF membranes was achieved through the filtration of a 10 wt.% sulphuric acid solution. The negatively charged surface of the PES MF membrane allowed the interaction between amino groups present in CHS, and finally, the membrane substrate received a negatively charged layer through the filtration of a GO solution. Characterization analysis such as contact angle, scanning electron microscopy (SEM), and attenuated total reflectance‐Fourier transform infrared spectroscopy (ATR‐FTIR) proved that the membranes were successfully modified. The effect of CHS and GO masses were analyzed, the membrane that showed the best performance was MF CHS1GO0.5 with a rejection of 100% of the Reactive Black 5 (RB5) dye, hydraulic permeability of 10.18 L/m2 · h · bar, and flux recovery ratio of 71.21%. Also, this membrane was able to be reused in three cycles, maintaining a rejection of RB5 higher than 85% during the last cycle. Therefore, the study provides an interesting alternative for the removal of anionic dyes solubilized in water from the textile industry.
Proposed interact mechanism for dye rejection. |
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ISSN: | 0008-4034 1939-019X |
DOI: | 10.1002/cjce.24278 |