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Engineering the band gap of Hf2CO2 MXene semiconductor by C/O doping

The modulations of electronic band structure of Hf 2 CO 2 MXene through substitution-doping approaches (two different substitution sites, i.e., C and O sites) are theoretically studied within the first-principles density functional theory. It is found that Si C -, Ge C -, BN C -, and NF O -doped Hf...

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Bibliographic Details
Published in:Journal of materials research 2021-04, Vol.36 (8), p.1678-1685
Main Authors: Zhang, Yujuan, Wu, Mingyu, Wang, Zhihang, Zhang, Ningning, Ge, Changchun
Format: Article
Language:English
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Summary:The modulations of electronic band structure of Hf 2 CO 2 MXene through substitution-doping approaches (two different substitution sites, i.e., C and O sites) are theoretically studied within the first-principles density functional theory. It is found that Si C -, Ge C -, BN C -, and NF O -doped Hf 2 CO 2 nanosheets remain semiconductor properties with a wide range of band gap, while N C/O -, B O -, P O -, and F O -doped Hf 2 CO 2 nanosheets possess to degenerate semiconductor or metallic characters. The orbital contribution analysis indicates that the p states of dopants play an important role in modulating the electronic band structures of the doped Hf 2 CO 2 nanosheets. Furthermore, negative solution energy and binding energy of the above doped systems indicate the feasibility of the doping technique. We hope that these results can provide a theoretical basis to engineer the band gap of Hf 2 CO 2 MXene materials and even guide these materials design and optimization in the applications of electronics. Graphic abstract
ISSN:0884-2914
2044-5326
DOI:10.1557/s43578-021-00200-x