Influence of Etching Modes on the Morphology and Composition of the Surface of Multilayer Porous Silicon

Based on X-ray reflectometry and ultrasoft X-ray spectroscopy data, the opportunity of controlling surface porosity using multi-stage electrochemical etching modes is presented. It is presented how, with an increase in the porosity index of the near-surface layer, the morphology changes and the degr...

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Bibliographic Details
Published in:Semiconductors (Woodbury, N.Y.) N.Y.), 2024-02, Vol.58 (2), p.145-148
Main Authors: Lenshin, A. S., Peshkov, Ya. A., Chernousova, O. V., Barkov, K. A., Kannykin, S. V.
Format: Article
Language:English
Subjects:
Electrochemical etching
Magnetic Materials
Magnetism
Morphology
Multilayers
Oxidation
Physics
Physics and Astronomy
Porosity
Porous silicon
Surface layers
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Summary:Based on X-ray reflectometry and ultrasoft X-ray spectroscopy data, the opportunity of controlling surface porosity using multi-stage electrochemical etching modes is presented. It is presented how, with an increase in the porosity index of the near-surface layer, the morphology changes and the degree of oxidation of multilayer porous silicon samples increases.
ISSN:1063-7826
1090-6479
DOI:10.1134/S106378262402009X