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Photocatalytic Destruction of Ceftriaxone in Aqueous Solutions
The kinetic tendencies in the destruction of cephalosporin antibiotics (ceftriaxone (CEF)) in photoinitiated oxidative systems were studied using a xenon lamp as a source of quasisolar radiation (UV–Vis). It was established that the oxidative systems under study can be arranged in the following seri...
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Published in: | Russian Journal of Physical Chemistry A 2024-10, Vol.98 (10), p.2241-2247 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | The kinetic tendencies in the destruction of cephalosporin antibiotics (ceftriaxone (CEF)) in photoinitiated oxidative systems were studied using a xenon lamp as a source of quasisolar radiation (UV–Vis). It was established that the oxidative systems under study can be arranged in the following series according to the efficiency and rate of antibiotic destruction: {UV–Vis/Fe
2+
/S
2
O
} > {Fe
2+
/S
2
O
}
{UV–Vis/S
2
O
} > {UV–Vis}. The optimum conditions for the oxidative destruction of CEF in the {UV–Vis/Fe
2+
/S
2
O
} system are reached at [S
2
O
] : [CEF] = 30 : 1 and [S
2
O
] : [Fe
2+
] = 1 : 0.1. As the temperature increases to 40°C, the initial CEF oxidation rate and efficiency increase. The apparent activation energy of the CEF oxidation in the {UV–Vis/Fe
2+
/S
2
O
} system was 45 kJ mol
–1
, which is comparable to the values obtained for cephalosporin antibiotics. It was proved, using inhibitors of radical reactions, that the oxidative destruction of CEF in combined {UV–Vis/Fe
2+
/S
2
O
} proceeds by a multiradical mechanism involving reactive oxygen species (ROS): hydroxyl radicals and sulfate and superoxide radical anions. The obtained tendencies are in good agreement with the results of open-air studies with natural solar radiation; in the {Solar/Fe
2+
/S
2
O
} system, the oxidation of CEF is significantly intensified due to combined activation of persulfate by the iron ions, the UV-C ( |
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ISSN: | 0036-0244 1531-863X |
DOI: | 10.1134/S0036024424701395 |