Advanced oxidation processes by UV/H2O2 for the removal of anionic surfactants in a decentralized wastewater treatment plant in Ecuador

Surfactants are persistent pollutants that pose risks to ecosystems and human health due to their low removal efficiency in conventional wastewater treatment plants. In Guayaquil, Ecuador, a decentralized facility discharges water with a surfactant concentration that exceeds the national legislation...

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Published in:Water science and technology 2024-10, Vol.90 (8), p.2340-2351
Main Authors: Jennifer, Zambrano-Aranea, Sonia, Arcentales-Dueñas, Francesca, Escala-Benites, Nadia, Flores-Manrique, Suanny, Mosquera-Romero
Format: Article
Language:English
Subjects:
Anions
Disinfection & disinfectants
Effluents
Hydrogen peroxide
Laboratories
Legislation
Oxidation
Oxidation process
Plant layout
Pollutants
Surfactants
Tertiary treatment
Ultraviolet radiation
Wastewater treatment
Wastewater treatment plants
Water discharge
Water treatment
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container_end_page 2351
container_issue 8
container_start_page 2340
container_title Water science and technology
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creator Jennifer, Zambrano-Aranea
Sonia, Arcentales-Dueñas
Francesca, Escala-Benites
Nadia, Flores-Manrique
Suanny, Mosquera-Romero
description Surfactants are persistent pollutants that pose risks to ecosystems and human health due to their low removal efficiency in conventional wastewater treatment plants. In Guayaquil, Ecuador, a decentralized facility discharges water with a surfactant concentration that exceeds the national legislation up to 20 times. This work aims to demonstrate the effectiveness of the advanced oxidation process UV/H2O2 in removing anionic surfactants as a tertiary treatment for the decentralized facility investigated. A laboratory-scale batch system was tested for the treatment of real effluent with three hydrogen peroxide concentrations (100, 250, and 500 mg L−1) and UV exposure up to 120 min. All experimental trials were run in duplicate. After 60 min of UV exposure with 250 mg L−1 of H2O2, the anionic surfactant removal was 94.3 ± 4.3%, and the effluent complied with the discharge limits (
doi_str_mv 10.2166/wst.2024.311
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1996-9732
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source Alma/SFX Local Collection
subjects Anions
Disinfection & disinfectants
Effluents
Hydrogen peroxide
Laboratories
Legislation
Oxidation
Oxidation process
Plant layout
Pollutants
Surfactants
Tertiary treatment
Ultraviolet radiation
Wastewater treatment
Wastewater treatment plants
Water discharge
Water treatment
title Advanced oxidation processes by UV/H2O2 for the removal of anionic surfactants in a decentralized wastewater treatment plant in Ecuador
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