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Characterization of a template process for conducting cluster-assembled wires

Bismuth and antimony clusters have been deposited onto spin coated PMMA layers patterned by electron-beam exposure. The probability of reflection or adhesion of the clusters from the PMMA depended on its surface roughness, determined by the electron-beam exposure dose. The Bi and Sb clusters exhibit...

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Bibliographic Details
Published in:Applied physics. A, Materials science & processing Materials science & processing, 2009-11, Vol.97 (2), p.315-321
Main Authors: Reichel, R., Partridge, J. G., Brown, S. A.
Format: Article
Language:English
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Summary:Bismuth and antimony clusters have been deposited onto spin coated PMMA layers patterned by electron-beam exposure. The probability of reflection or adhesion of the clusters from the PMMA depended on its surface roughness, determined by the electron-beam exposure dose. The Bi and Sb clusters exhibited a significantly higher probability of reflection from unexposed PMMA than from Si 3 N 4 (grown by plasma enhanced chemical vapor deposition) despite the approximately equal surface roughness of these layers. By exploiting this difference in adhesion/reflection, a cluster-assembled wire was grown between four-point planar electrodes. Four-probe electrical measurements yielded linear current-voltage ( I ( V )) characteristics whilst non-linear I ( V ) characteristics were obtained from two-probe measurements. An established model provided good agreement with two-probe conductance-voltage and resistance-temperature data. Tunneling barriers between the cluster wire and the planar electrodes are believed to have caused the non-linear two-point I ( V ) characteristics.
ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-009-5385-x