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Characterization of a template process for conducting cluster-assembled wires
Bismuth and antimony clusters have been deposited onto spin coated PMMA layers patterned by electron-beam exposure. The probability of reflection or adhesion of the clusters from the PMMA depended on its surface roughness, determined by the electron-beam exposure dose. The Bi and Sb clusters exhibit...
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Published in: | Applied physics. A, Materials science & processing Materials science & processing, 2009-11, Vol.97 (2), p.315-321 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Bismuth and antimony clusters have been deposited onto spin coated PMMA layers patterned by electron-beam exposure. The probability of reflection or adhesion of the clusters from the PMMA depended on its surface roughness, determined by the electron-beam exposure dose. The Bi and Sb clusters exhibited a significantly higher probability of reflection from unexposed PMMA than from Si
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(grown by plasma enhanced chemical vapor deposition) despite the approximately equal surface roughness of these layers. By exploiting this difference in adhesion/reflection, a cluster-assembled wire was grown between four-point planar electrodes. Four-probe electrical measurements yielded linear current-voltage (
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(
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)) characteristics whilst non-linear
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(
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) characteristics were obtained from two-probe measurements. An established model provided good agreement with two-probe conductance-voltage and resistance-temperature data. Tunneling barriers between the cluster wire and the planar electrodes are believed to have caused the non-linear two-point
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(
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) characteristics. |
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ISSN: | 0947-8396 1432-0630 |
DOI: | 10.1007/s00339-009-5385-x |