Loading…
Effect of modulation periods on the microstructure and mechanical properties of DLC/TiC multilayer films deposited by filtered cathodic vacuum arc method
•DLC/TiC multilayer films with different modulation periods at same modulation ratio 1:1 were deposited by FCVA.•The residual stress of DLC/TiC multilayer films decreases with the modulation periods decrease.•The hardness of the multilayer DLC films decreases with modulation periods increasing. The...
Saved in:
Published in: | Applied surface science 2015-02, Vol.328, p.319-324 |
---|---|
Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Summary: | •DLC/TiC multilayer films with different modulation periods at same modulation ratio 1:1 were deposited by FCVA.•The residual stress of DLC/TiC multilayer films decreases with the modulation periods decrease.•The hardness of the multilayer DLC films decreases with modulation periods increasing.
The high stress of diamond-like carbon (DLC) film limits its thickness and adhesion on substrate. Multilayer structure is one approach to overcome this disadvantage. In this paper, the DLC/TiC multilayer films with different modulation periods (80nm, 106nm or 160nm) at same modulation ratio of 1:1 were deposited on Si(100) wafer and Ti-6Al-4V substrate by filtered cathodic vacuum arc (FCVA) technology. X-ray diffraction (XRD), transmission electron microscopy (TEM), nanoindention and wear test were employed to investigate the effect of modulation periods on the microstructure and mechanical properties of the multilayer films. The results showed that the residual stress of the DLC/TiC multilayer films could be effectively reduced and the residual stress decreased with the modulation periods decreasing. The hardness of the DLC/TiC multilayer films increased with modulation periods decreasing. The DLC/TiC multilayer film with modulation period of 106nm had the best wear resistance due to the good combination of hardness, ductility and low compressive stress. |
---|---|
ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/j.apsusc.2014.12.041 |