Deposition and in-situ characterization of Ti–Zr–V alloy thin films annealed at different temperatures under ultra-high vacuum conditions

Thin films of Ti–Zr–V alloy have been deposited using an indigenously developed DC magnetron sputtering system. The microstructure of the deposited films investigated by GIXRD, AFM and FESEM exhibited a morphology that depended on substrate and deposition environment. Films deposited on stainless st...

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Bibliographic Details
Published in:Journal of alloys and compounds 2015-12, Vol.651, p.375-381
Main Authors: Sharma, R.K., Jagannath, Bhattacharya, S., Tokas, R.B., Bhushan, K.G., Sen, Shashwati, Gadkari, S.C., Gupta, S.K.
Format: Article
Language:English
Subjects:
Annealing
Deposition
Heat treatment
Magnetron sputtering
Non-evaporable getters
Substrates
Surface chemistry
Thin films
Titanium base alloys
XPS
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Summary:Thin films of Ti–Zr–V alloy have been deposited using an indigenously developed DC magnetron sputtering system. The microstructure of the deposited films investigated by GIXRD, AFM and FESEM exhibited a morphology that depended on substrate and deposition environment. Films deposited on stainless steel (SS) substrates in argon ambient exhibited a columnar growth with nanocrystalline grains of about 40 nm. The films were also studied using the X-ray photo-emission electron spectroscopy (XPS) after annealing them in-situ at different temperatures for two hours in ultra-high vacuum environment. The results observed through variations in the oxidation state showed that the heat treatment in vacuum leads to disappearance of the superficial oxide layer covering the Ti–V–Zr films. After heating at 180 °C the metal-oxides changed into metallic surface that was extremely conducive to adsorption of surrounding gaseous species followed by their absorption or chemical fixation. The studies suggest that the films deposited on SS substrates are suitable as a Non-Evaporable Getter (NEG) to achieve extreme high vacuum (XHV). [Display omitted] •Ti–Zr–V alloy films with a grain size of 40 nm are deposited on SS and Si substrates.•2D/3D AFM micrographs reveal different textures of films deposited in Ar and Kr.•Films deposited in Ar ambient are relatively more rough and show a columnar growth.•Temperature dependent valance states of Ti, Zr, and V are studied in-situ using XPS.•Films of Ti21Zr24V55 exhibited the lowest activation temperature (160 °C).
ISSN:0925-8388
1873-4669
DOI:10.1016/j.jallcom.2015.08.040