Kinetic Competition between Water‐Splitting and Photocorrosion Reactions in Photoelectrochemical Devices

Semiconductor photocorrosion is a major challenge for the stability of photoelectrochemical water‐splitting devices. Usually, photocorrosion is studied on the basis of thermodynamic aspects, by comparing the redox potentials of water to the self‐decomposition potentials of the semiconductor or analy...

Full description

Saved in:
Bibliographic Details
Published in:ChemSusChem 2019-05, Vol.12 (9), p.1984-1994
Main Authors: Nandjou, Fredy, Haussener, Sophia
Format: Article
Language:English
Subjects:
Carrier density
Charge density
Chemical activity
Chemical properties
Competition
Current carriers
Decomposition
electrochemistry
Electrolytes
Extreme values
kinetics
Organic chemistry
photochemistry
Photoelectrochemical devices
Reaction mechanisms
semiconductors
Water splitting
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Semiconductor photocorrosion is a major challenge for the stability of photoelectrochemical water‐splitting devices. Usually, photocorrosion is studied on the basis of thermodynamic aspects, by comparing the redox potentials of water to the self‐decomposition potentials of the semiconductor or analyzing the equilibrium phases at given electrolyte conditions. However, that approach does not allow for a prediction of the decomposition rate of the semiconductor or the branching ratio with the redox reaction. A kinetic model has been developed to describe detailed reaction mechanisms and investigate competition between water‐splitting and photocorrosion reactions. It is observed that some thermodynamically unstable semiconductors should photocorrode in a few minutes, whereas others are expected to operate over a period of years as a result of their extremely low photocorrosion current. The photostability of the semiconductor is mainly found to depend on surface chemical properties, catalyst activity, charge carrier density, and electrolyte acidity. Predicting longevity: Semiconductor photocorrosion is a major challenge for the stability of photoelectrochemical water‐splitting devices. A kinetic model to describe detailed reaction mechanisms and competition between water‐splitting and photocorrosion reactions is provided and reveals that the photostability of a semiconductor mainly depends on surface chemical properties, catalyst activity, charge carrier density, and electrolyte acidity.
ISSN:1864-5631
1864-564X
DOI:10.1002/cssc.201802558