Loading…

Kinetic Competition between Water‐Splitting and Photocorrosion Reactions in Photoelectrochemical Devices

Semiconductor photocorrosion is a major challenge for the stability of photoelectrochemical water‐splitting devices. Usually, photocorrosion is studied on the basis of thermodynamic aspects, by comparing the redox potentials of water to the self‐decomposition potentials of the semiconductor or analy...

Full description

Saved in:
Bibliographic Details
Published in:ChemSusChem 2019-05, Vol.12 (9), p.1984-1994
Main Authors: Nandjou, Fredy, Haussener, Sophia
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by cdi_FETCH-LOGICAL-c5168-2cd9e766f1ddf3cc5b858f33b2a449f4ed56de62fb48ed8762fd229857d6b5a03
cites cdi_FETCH-LOGICAL-c5168-2cd9e766f1ddf3cc5b858f33b2a449f4ed56de62fb48ed8762fd229857d6b5a03
container_end_page 1994
container_issue 9
container_start_page 1984
container_title ChemSusChem
container_volume 12
creator Nandjou, Fredy
Haussener, Sophia
description Semiconductor photocorrosion is a major challenge for the stability of photoelectrochemical water‐splitting devices. Usually, photocorrosion is studied on the basis of thermodynamic aspects, by comparing the redox potentials of water to the self‐decomposition potentials of the semiconductor or analyzing the equilibrium phases at given electrolyte conditions. However, that approach does not allow for a prediction of the decomposition rate of the semiconductor or the branching ratio with the redox reaction. A kinetic model has been developed to describe detailed reaction mechanisms and investigate competition between water‐splitting and photocorrosion reactions. It is observed that some thermodynamically unstable semiconductors should photocorrode in a few minutes, whereas others are expected to operate over a period of years as a result of their extremely low photocorrosion current. The photostability of the semiconductor is mainly found to depend on surface chemical properties, catalyst activity, charge carrier density, and electrolyte acidity. Predicting longevity: Semiconductor photocorrosion is a major challenge for the stability of photoelectrochemical water‐splitting devices. A kinetic model to describe detailed reaction mechanisms and competition between water‐splitting and photocorrosion reactions is provided and reveals that the photostability of a semiconductor mainly depends on surface chemical properties, catalyst activity, charge carrier density, and electrolyte acidity.
doi_str_mv 10.1002/cssc.201802558
format article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_2179341657</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2179341657</sourcerecordid><originalsourceid>FETCH-LOGICAL-c5168-2cd9e766f1ddf3cc5b858f33b2a449f4ed56de62fb48ed8762fd229857d6b5a03</originalsourceid><addsrcrecordid>eNqFkc1O3DAUhS3UqvyULcsqUjdsZrAd23GWVfgpAgnUaVV2lmPfgEdJPNgeELs-Qp-RJ8GjoYPEpndzj-TvHt3rg9ABwVOCMT0yMZopxURiyrncQjtECjbhgt182OiSbKPdGOcYC1wL8Qltl1gwRkS1g-YXboTkTNH4YZFFcn4sWkiPAGPxWycIz3_-zha9S8mNt4UebXF955M3PgQfV_AP0GY1FQs3rt-gB5OCN3cwOKP74hgenIH4GX3sdB9h_7XvoV-nJz-b75PLq7Pz5tvlxHAi5IQaW0MlREes7UpjeCu57MqypZqxumNgubAgaNcyCVZWWVlKa8krK1qucbmHDte-i-DvlxCTGlw00Pd6BL-MipKqLvP1vMro13fo3C_DmLdTNBcTklYiU9M1ZfLJMUCnFsENOjwpgtUqBbVKQW1SyANfXm2X7QB2g__79gzUa-DR9fD0HzvVzGbNm_kLOveXBA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2222468276</pqid></control><display><type>article</type><title>Kinetic Competition between Water‐Splitting and Photocorrosion Reactions in Photoelectrochemical Devices</title><source>Wiley-Blackwell Read &amp; Publish Collection</source><creator>Nandjou, Fredy ; Haussener, Sophia</creator><creatorcontrib>Nandjou, Fredy ; Haussener, Sophia</creatorcontrib><description>Semiconductor photocorrosion is a major challenge for the stability of photoelectrochemical water‐splitting devices. Usually, photocorrosion is studied on the basis of thermodynamic aspects, by comparing the redox potentials of water to the self‐decomposition potentials of the semiconductor or analyzing the equilibrium phases at given electrolyte conditions. However, that approach does not allow for a prediction of the decomposition rate of the semiconductor or the branching ratio with the redox reaction. A kinetic model has been developed to describe detailed reaction mechanisms and investigate competition between water‐splitting and photocorrosion reactions. It is observed that some thermodynamically unstable semiconductors should photocorrode in a few minutes, whereas others are expected to operate over a period of years as a result of their extremely low photocorrosion current. The photostability of the semiconductor is mainly found to depend on surface chemical properties, catalyst activity, charge carrier density, and electrolyte acidity. Predicting longevity: Semiconductor photocorrosion is a major challenge for the stability of photoelectrochemical water‐splitting devices. A kinetic model to describe detailed reaction mechanisms and competition between water‐splitting and photocorrosion reactions is provided and reveals that the photostability of a semiconductor mainly depends on surface chemical properties, catalyst activity, charge carrier density, and electrolyte acidity.</description><identifier>ISSN: 1864-5631</identifier><identifier>EISSN: 1864-564X</identifier><identifier>DOI: 10.1002/cssc.201802558</identifier><identifier>PMID: 30644167</identifier><language>eng</language><publisher>Germany: Wiley Subscription Services, Inc</publisher><subject>Carrier density ; Charge density ; Chemical activity ; Chemical properties ; Competition ; Current carriers ; Decomposition ; electrochemistry ; Electrolytes ; Extreme values ; kinetics ; Organic chemistry ; photochemistry ; Photoelectrochemical devices ; Reaction mechanisms ; semiconductors ; Water splitting</subject><ispartof>ChemSusChem, 2019-05, Vol.12 (9), p.1984-1994</ispartof><rights>2019 Wiley‐VCH Verlag GmbH &amp; Co. KGaA, Weinheim</rights><rights>2019 Wiley-VCH Verlag GmbH &amp; Co. KGaA, Weinheim.</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c5168-2cd9e766f1ddf3cc5b858f33b2a449f4ed56de62fb48ed8762fd229857d6b5a03</citedby><cites>FETCH-LOGICAL-c5168-2cd9e766f1ddf3cc5b858f33b2a449f4ed56de62fb48ed8762fd229857d6b5a03</cites><orcidid>0000-0002-3044-1662</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27900,27901</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/30644167$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Nandjou, Fredy</creatorcontrib><creatorcontrib>Haussener, Sophia</creatorcontrib><title>Kinetic Competition between Water‐Splitting and Photocorrosion Reactions in Photoelectrochemical Devices</title><title>ChemSusChem</title><addtitle>ChemSusChem</addtitle><description>Semiconductor photocorrosion is a major challenge for the stability of photoelectrochemical water‐splitting devices. Usually, photocorrosion is studied on the basis of thermodynamic aspects, by comparing the redox potentials of water to the self‐decomposition potentials of the semiconductor or analyzing the equilibrium phases at given electrolyte conditions. However, that approach does not allow for a prediction of the decomposition rate of the semiconductor or the branching ratio with the redox reaction. A kinetic model has been developed to describe detailed reaction mechanisms and investigate competition between water‐splitting and photocorrosion reactions. It is observed that some thermodynamically unstable semiconductors should photocorrode in a few minutes, whereas others are expected to operate over a period of years as a result of their extremely low photocorrosion current. The photostability of the semiconductor is mainly found to depend on surface chemical properties, catalyst activity, charge carrier density, and electrolyte acidity. Predicting longevity: Semiconductor photocorrosion is a major challenge for the stability of photoelectrochemical water‐splitting devices. A kinetic model to describe detailed reaction mechanisms and competition between water‐splitting and photocorrosion reactions is provided and reveals that the photostability of a semiconductor mainly depends on surface chemical properties, catalyst activity, charge carrier density, and electrolyte acidity.</description><subject>Carrier density</subject><subject>Charge density</subject><subject>Chemical activity</subject><subject>Chemical properties</subject><subject>Competition</subject><subject>Current carriers</subject><subject>Decomposition</subject><subject>electrochemistry</subject><subject>Electrolytes</subject><subject>Extreme values</subject><subject>kinetics</subject><subject>Organic chemistry</subject><subject>photochemistry</subject><subject>Photoelectrochemical devices</subject><subject>Reaction mechanisms</subject><subject>semiconductors</subject><subject>Water splitting</subject><issn>1864-5631</issn><issn>1864-564X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><recordid>eNqFkc1O3DAUhS3UqvyULcsqUjdsZrAd23GWVfgpAgnUaVV2lmPfgEdJPNgeELs-Qp-RJ8GjoYPEpndzj-TvHt3rg9ABwVOCMT0yMZopxURiyrncQjtECjbhgt182OiSbKPdGOcYC1wL8Qltl1gwRkS1g-YXboTkTNH4YZFFcn4sWkiPAGPxWycIz3_-zha9S8mNt4UebXF955M3PgQfV_AP0GY1FQs3rt-gB5OCN3cwOKP74hgenIH4GX3sdB9h_7XvoV-nJz-b75PLq7Pz5tvlxHAi5IQaW0MlREes7UpjeCu57MqypZqxumNgubAgaNcyCVZWWVlKa8krK1qucbmHDte-i-DvlxCTGlw00Pd6BL-MipKqLvP1vMro13fo3C_DmLdTNBcTklYiU9M1ZfLJMUCnFsENOjwpgtUqBbVKQW1SyANfXm2X7QB2g__79gzUa-DR9fD0HzvVzGbNm_kLOveXBA</recordid><startdate>20190508</startdate><enddate>20190508</enddate><creator>Nandjou, Fredy</creator><creator>Haussener, Sophia</creator><general>Wiley Subscription Services, Inc</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>K9.</scope><scope>7X8</scope><orcidid>https://orcid.org/0000-0002-3044-1662</orcidid></search><sort><creationdate>20190508</creationdate><title>Kinetic Competition between Water‐Splitting and Photocorrosion Reactions in Photoelectrochemical Devices</title><author>Nandjou, Fredy ; Haussener, Sophia</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c5168-2cd9e766f1ddf3cc5b858f33b2a449f4ed56de62fb48ed8762fd229857d6b5a03</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><topic>Carrier density</topic><topic>Charge density</topic><topic>Chemical activity</topic><topic>Chemical properties</topic><topic>Competition</topic><topic>Current carriers</topic><topic>Decomposition</topic><topic>electrochemistry</topic><topic>Electrolytes</topic><topic>Extreme values</topic><topic>kinetics</topic><topic>Organic chemistry</topic><topic>photochemistry</topic><topic>Photoelectrochemical devices</topic><topic>Reaction mechanisms</topic><topic>semiconductors</topic><topic>Water splitting</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Nandjou, Fredy</creatorcontrib><creatorcontrib>Haussener, Sophia</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>ProQuest Health &amp; Medical Complete (Alumni)</collection><collection>MEDLINE - Academic</collection><jtitle>ChemSusChem</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Nandjou, Fredy</au><au>Haussener, Sophia</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Kinetic Competition between Water‐Splitting and Photocorrosion Reactions in Photoelectrochemical Devices</atitle><jtitle>ChemSusChem</jtitle><addtitle>ChemSusChem</addtitle><date>2019-05-08</date><risdate>2019</risdate><volume>12</volume><issue>9</issue><spage>1984</spage><epage>1994</epage><pages>1984-1994</pages><issn>1864-5631</issn><eissn>1864-564X</eissn><abstract>Semiconductor photocorrosion is a major challenge for the stability of photoelectrochemical water‐splitting devices. Usually, photocorrosion is studied on the basis of thermodynamic aspects, by comparing the redox potentials of water to the self‐decomposition potentials of the semiconductor or analyzing the equilibrium phases at given electrolyte conditions. However, that approach does not allow for a prediction of the decomposition rate of the semiconductor or the branching ratio with the redox reaction. A kinetic model has been developed to describe detailed reaction mechanisms and investigate competition between water‐splitting and photocorrosion reactions. It is observed that some thermodynamically unstable semiconductors should photocorrode in a few minutes, whereas others are expected to operate over a period of years as a result of their extremely low photocorrosion current. The photostability of the semiconductor is mainly found to depend on surface chemical properties, catalyst activity, charge carrier density, and electrolyte acidity. Predicting longevity: Semiconductor photocorrosion is a major challenge for the stability of photoelectrochemical water‐splitting devices. A kinetic model to describe detailed reaction mechanisms and competition between water‐splitting and photocorrosion reactions is provided and reveals that the photostability of a semiconductor mainly depends on surface chemical properties, catalyst activity, charge carrier density, and electrolyte acidity.</abstract><cop>Germany</cop><pub>Wiley Subscription Services, Inc</pub><pmid>30644167</pmid><doi>10.1002/cssc.201802558</doi><tpages>11</tpages><orcidid>https://orcid.org/0000-0002-3044-1662</orcidid><oa>free_for_read</oa></addata></record>
fulltext fulltext
identifier ISSN: 1864-5631
ispartof ChemSusChem, 2019-05, Vol.12 (9), p.1984-1994
issn 1864-5631
1864-564X
language eng
recordid cdi_proquest_miscellaneous_2179341657
source Wiley-Blackwell Read & Publish Collection
subjects Carrier density
Charge density
Chemical activity
Chemical properties
Competition
Current carriers
Decomposition
electrochemistry
Electrolytes
Extreme values
kinetics
Organic chemistry
photochemistry
Photoelectrochemical devices
Reaction mechanisms
semiconductors
Water splitting
title Kinetic Competition between Water‐Splitting and Photocorrosion Reactions in Photoelectrochemical Devices
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-24T14%3A10%3A50IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Kinetic%20Competition%20between%20Water%E2%80%90Splitting%20and%20Photocorrosion%20Reactions%20in%20Photoelectrochemical%20Devices&rft.jtitle=ChemSusChem&rft.au=Nandjou,%20Fredy&rft.date=2019-05-08&rft.volume=12&rft.issue=9&rft.spage=1984&rft.epage=1994&rft.pages=1984-1994&rft.issn=1864-5631&rft.eissn=1864-564X&rft_id=info:doi/10.1002/cssc.201802558&rft_dat=%3Cproquest_cross%3E2179341657%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c5168-2cd9e766f1ddf3cc5b858f33b2a449f4ed56de62fb48ed8762fd229857d6b5a03%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=2222468276&rft_id=info:pmid/30644167&rfr_iscdi=true