Metallic glass formation by ion implantation into nickel

• Published in: Vacuum 1984-01, Vol.34 (10), p.861-865
• Main Authors: Al-Tamimi, ZY, Grant, WA, Grundy, PJ
• Format: Article
• Language: English
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Ion radiation effects; Materials science; Metals, semimetals and alloys; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation; Other interactions of matter with particles and radiation; Physical radiation effects, radiation damage; Physics; Specific materials; Structure of solids and liquids; crystallography
• ISSN: 0042-207X; 1879-2715
• DOI: 10.1016/0042-207X(84)90164-7

It has recently been shown that ion implantation is a suitable technique to produce stable amorphous metallic alloys. Direct ion implantation of transition metals such as Ni and Fe at room temperature with metalloid or rare earth ions has been shown to yield amorphous metallic alloys. The ability of metalloids to stabilize amorphous phases is examined further in the present work by implantation of 40 keV ions (such as B +, C +, Si +, P +, Ge +, As +, Se +, Sb + and Te +) in the fluence range 10 15–10 17 ions cm −2, into single crystal and polycrystalline nickel foils and thin films. Self-ion irradiation of Ni has also been performed to provide insights into the various criteria that determine the stability, or otherwise, of amorphous metallic phases. Transmission electron microscopy and diffraction has been employed to study the phase transformations due to ion implantation. The results show that a wide range of metalloids will stabilise an amorphous phase with nickel.