Nitrogen Adsorption onto Silane-Derived Silicon Powders

Nitrogen chemisorption onto silane‐derived silicon powder was studied at atmospheric pressure in N2, using thermogravimetric analysis (TGA) to examine the reaction kinetics and using Fourier transform infrared (FTIR) spectroscopy to characterize the surface chemistry. Above 700°C the initial Si—H su...

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Bibliographic Details
Published in:Journal of the American Ceramic Society 1991-06, Vol.74 (6), p.1417-1424
Main Authors: Sheldon, Brian W., Haggerty, John S.
Format: Article
Language:English
Subjects:
Chemistry
Exact sciences and technology
General and physical chemistry
nitrogen adsorption
powders
silicon
Solid-gas interface
surface
Surface physical chemistry
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Summary:Nitrogen chemisorption onto silane‐derived silicon powder was studied at atmospheric pressure in N2, using thermogravimetric analysis (TGA) to examine the reaction kinetics and using Fourier transform infrared (FTIR) spectroscopy to characterize the surface chemistry. Above 700°C the initial Si—H surface is transformed to an Si—N surface; the latter is characterized by a broad infrared absorption band at 830 to 840 cm−1. Isothermal TGA data exhibit a sigmoidal shape which is apparently caused by simultaneous hydrogen desorption and nitrogen adsorption. By holding samples under vacuum at 900°C before nitridation the adsorption reaction was isolated. The kinetics of this reaction are well described by a simple first‐order model with an activation energy of 140 kJ/mol, and with very low sticking probabilities (between 10−13 and 10−10).
ISSN:0002-7820
1551-2916
DOI:10.1111/j.1151-2916.1991.tb04122.x