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Oxidation of a polycrystalline titanium surface by oxygen and water

Reactions of a well-characterized polycrystalline titanium surface with oxygen and water molecules at 150–850 K were studied in UHV by X-ray photoelectron spectroscopy (XPS), thermal desorption spectroscopy (TDS) and Fourier transform reflectance–absorption infrared spectroscopy (FT-RAIRS). At 150 K...

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Bibliographic Details
Published in:Surface science 2000-06, Vol.458 (1), p.80-90
Main Authors: Lu, Gang, Bernasek, Steven L., Schwartz, Jeffrey
Format: Article
Language:English
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Summary:Reactions of a well-characterized polycrystalline titanium surface with oxygen and water molecules at 150–850 K were studied in UHV by X-ray photoelectron spectroscopy (XPS), thermal desorption spectroscopy (TDS) and Fourier transform reflectance–absorption infrared spectroscopy (FT-RAIRS). At 150 K, O 2 oxidizes Ti 0 to Ti IV, Ti III and Ti II, but Ti exposure to H 2O at this temperature produces only Ti II species. At temperatures above 300 K, further oxidation of Ti by H 2O was observed. Maximum oxidation by either molecule is achieved at 550–600 K. Upon heating the oxidized titanium above 850 K, the oxide layer is completely reduced to Ti 0. Hydroxyl species are identified on the Ti surface after reaction with H 2O; they appear to be mostly hydrogen bonded between 250 and 350 K, and isolated in the 450–650 K surface temperature range. Depth profiling of the O 2-oxidized Ti surface shows that Ti IV/Ti III species account for about 20% of the total thickness of the oxide layers and are located near the surface, while Ti II has a broader distribution, and is concentrated close to the oxide–metal interface. The OH group concentration is maximized at 550 K on the sample surface and accounts for about 16% of the total surface oxygen, with a decreasing concentration of OH into the bulk of the titanium oxides.
ISSN:0039-6028
1879-2758
DOI:10.1016/S0039-6028(00)00420-9