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Density functional theory based computational investigations on the stability of highly active trimetallic PtPdCu nanoalloys for electrochemical oxygen reduction

Activity, cost, and durability are the trinity of catalysis research for the electrochemical oxygen reduction reaction (ORR). While studies towards increasing activity and reducing cost of ORR catalysts have been carried out extensively, much effort is needed in durability investigation of highly ac...

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Published in:Faraday discussions 2023-01, Vol.242, p.429-442
Main Authors: Wang, Lichang, Ore, Rotimi M, Jayamaha, Peshala K, Wu, Zhi-Peng, Zhong, Chuan-Jian
Format: Article
Language:English
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Summary:Activity, cost, and durability are the trinity of catalysis research for the electrochemical oxygen reduction reaction (ORR). While studies towards increasing activity and reducing cost of ORR catalysts have been carried out extensively, much effort is needed in durability investigation of highly active ORR catalysts. In this work, we examined the stability of a trimetallic PtPdCu catalyst that has demonstrated high activity and incredible durability during ORR using density functional theory (DFT) based computations. Specifically, we studied the processes of dissolution/deposition and diffusion between the surface and inner layer of Cu species of Pt 20 Pd 20 Cu 60 catalysts at electrode potentials up to 1.2 V to understand their role towards stabilizing Pt 20 Pd 20 Cu 60 catalysts. The results show there is a dynamic Cu surface composition range that is dictated by the interplay of the four processes, dissolution, deposition, diffusion from the surface to inner layer, and diffusion from the inner layer to the surface of Cu species, in the stability and observed oscillation of lattice constants of Cu-rich PtPdCu nanoalloys. The stability of highly active trimetallic PtPdCu nanoalloys for electrochemical oxygenation reduction is a result of closed-loop oscillation processes among dissolution, deposition, and Cu diffusions between the inner layers and the surface layer.
ISSN:1359-6640
1364-5498
DOI:10.1039/d2fd00101b