The oxidation kinetics of Mg and Al surfaces studied by AES and XPS

Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) have been used to study the oxidation kinetics of pure aluminum and magnesium surfaces across a wide range of exposure to water vapour and humid laboratory air. The oxide growth during the low exposure range (up to 10 L, 1...

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Bibliographic Details
Published in:Surface science 1997-10, Vol.387 (1), p.192-198
Main Authors: Do, T., Splinter, S.J., Chen, C., McIntyre, N.S.
Format: Article
Language:English
Subjects:
Aluminum oxide
Chemistry
Exact sciences and technology
General and physical chemistry
Magnesium oxide
Oxidation
Solid-gas interface
Surface chemical reaction
Surface physical chemistry
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Summary:Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) have been used to study the oxidation kinetics of pure aluminum and magnesium surfaces across a wide range of exposure to water vapour and humid laboratory air. The oxide growth during the low exposure range (up to 10 L, 1 L = 1.33 × 10 −4 Pa·s) was examined by AES, and during the high exposure range (from 50 L to 1 × 10 6 L in ultra-high vacuum and to 1 × 10 14 L in laboratory air) by XPS. It was found that the oxidation process can be divided into three reaction regimes: (1) an initial chemisorption stage up to exposures of ca 0.7 L; (2) nucleation and growth of oxide islands until coalescence at ca 5 L; and (3) bulk oxide thickening best described by inverse logarithmic kinetics.
ISSN:0039-6028
1879-2758
DOI:10.1016/S0039-6028(97)00351-8