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Laser writing of spin defects in nanophotonic cavities
High-yield engineering and characterization of cavity–emitter coupling is an outstanding challenge in developing scalable quantum network nodes. Ex situ defect formation systems prevent real-time analysis, and previous in situ methods are limited to bulk substrates or require further processing to i...
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Published in: | Nature materials 2023-06, Vol.22 (6), p.696-702 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | High-yield engineering and characterization of cavity–emitter coupling is an outstanding challenge in developing scalable quantum network nodes. Ex situ defect formation systems prevent real-time analysis, and previous in situ methods are limited to bulk substrates or require further processing to improve the emitter properties
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. Here we demonstrate the direct laser writing of cavity-integrated spin defects using a nanosecond pulsed above-bandgap laser. Photonic crystal cavities in 4H-silicon carbide serve as a nanoscope monitoring silicon-monovacancy defect formation within the approximately 200 nm
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cavity-mode volume. We observe spin resonance, cavity-integrated photoluminescence and excited-state lifetimes consistent with conventional defect formation methods, without the need for post-irradiation thermal annealing. We further find an exponential reduction in excited-state lifetime at fluences approaching the cavity amorphization threshold and show the single-shot annealing of intrinsic background defects at silicon-monovacancy formation sites. This real-time in situ method of localized defect formation, paired with cavity-integrated defect spins, is necessary towards engineering cavity–emitter coupling for quantum networking.
Using direct laser writing with a nanosecond pulsed laser operating at above-bandgap photon energies, we demonstrate the selective formation of spin defects in photonic crystal cavities in 4H-silicon carbide and their in situ characterization. |
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ISSN: | 1476-1122 1476-4660 |
DOI: | 10.1038/s41563-023-01544-x |