Correlating the Valence State with the Adsorption Behavior of a Cu-Based Electrocatalyst for Furfural Oxidation with Anodic Hydrogen Production Reaction

The low-potential furfural oxidation reaction (FFOR) on a Cu-based electrocatalyst can produce H at the anode, thereby providing a bipolar H production system with an ultralow cell voltage. However, the intrinsic activity and stability of the Cu-based electrocatalyst for the FFOR remain unsatisfacto...

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Published in:Advanced materials (Weinheim) 2023-09, Vol.35 (39), p.e2304203-e2304203
Main Authors: Yang, Ming, Li, Yingying, Dong, Chung-Li, Li, Shengkai, Xu, Leitao, Chen, Wei, Wu, Jingcheng, Lu, Yuxuan, Pan, Yuping, Wu, Yandong, Luo, Yongxiang, Huang, Yu-Cheng, Wang, Shuangyin, Zou, Yuqin
Format: Article
Language:English
Subjects:
Adsorption
Anodizing
Correlation
Electric potential
Electrocatalysts
Electrolytes
Furfural
Hydrogen production
Materials science
Oxidation
Stability
Valence
Voltage
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Summary:The low-potential furfural oxidation reaction (FFOR) on a Cu-based electrocatalyst can produce H at the anode, thereby providing a bipolar H production system with an ultralow cell voltage. However, the intrinsic activity and stability of the Cu-based electrocatalyst for the FFOR remain unsatisfactory for practical applications. This study investigates the correlation between the valence state and the adsorption behavior of the Cu-based electrocatalyst in furfural oxidation. Cu is the adsorption site with low intrinsic activity. Cu , which exists in the form of Cu(OH) in alkaline electrolytes, has no adsorption ability but can improve the performance of Cu by promoting the adsorption of FF. Moreover, a mixed-valence Cu-based electrocatalyst (MV Cu) with high intrinsic activity and stability is prepared electrochemically. With the MV Cu catalyst, the assembled dual-side H production electrolyzer has a low electricity requirement of only 0.24 kWh m at an ultralow cell voltage of 0.3 V, and it exhibits sufficient stability. This study not only correlates the valence state with the adsorption behavior of the Cu-based electrocatalyst for the low-potential FFOR with anodic H production but also reveals the mechanism of deactivation to provide design principles for Cu-based electrocatalysts with satisfactory stability.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.202304203