Electrochemical properties of boron–carbon–nitride films formed by magnetron sputtering

The electrochemical behavior of B 1.0C 2.4N 1.0 thin film was investigated in acidic, neutral and alkaline solutions. The anodic polarization curve of the film in 1 M NaOH showed the anodic dissolution of the film. The curve of the film in 1 M HCl showed no anodic dissolution. The cathodic polarizat...

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Bibliographic Details
Published in:Electrochimica acta 2006-03, Vol.51 (13), p.2662-2668
Main Authors: Byon, Eungsun, Son, Myungsook, Lee, Koo-Hyun, Nam, Kee-Seok, Hara, Nobuyoshi, Sugimoto, Katsuhisa
Format: Article
Language:English
Subjects:
Boron–carbon–nitride films
Chemical composition
Cross-disciplinary physics: materials science
rheology
Electrochemical properties
Exact sciences and technology
Magnetron sputtering
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Spray coating techniques
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Summary:The electrochemical behavior of B 1.0C 2.4N 1.0 thin film was investigated in acidic, neutral and alkaline solutions. The anodic polarization curve of the film in 1 M NaOH showed the anodic dissolution of the film. The curve of the film in 1 M HCl showed no anodic dissolution. The cathodic polarization curve in 1 M NaCl showed shift to a negative potential side, but the anodic polarization curve was the same as that of Pt. The anodic dissolution in 1 M NaOH depended on potentials, that is, no anodic dissolution was recognized in a potential range of −0.2 to 0.1 V but the dissolution rate increased with increasing potential in a range of 0.1–0.6 V. The anodic current density of the film is directly proportional to the dissolution rate at potentials higher than 0.1 V. The dissolution rate of the film was increased with increasing solution pH.
ISSN:0013-4686
1873-3859
DOI:10.1016/j.electacta.2005.08.006