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Phase-Change Memory from Molecular Tellurides

Phase-change memory (PCM) is an emerging memory technology based on the resistance contrast between the crystalline and amorphous states of a material. Further development and realization of PCM as a mainstream memory technology rely on innovative materials and inexpensive fabrication methods. Here,...

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Bibliographic Details
Published in:ACS nano 2024-01, Vol.18 (1), p.1063-1072
Main Authors: Schenk, Florian M., Zellweger, Till, Kumaar, Dhananjeya, Bošković, Darijan, Wintersteller, Simon, Solokha, Pavlo, De Negri, Serena, Emboras, Alexandros, Wood, Vanessa, Yarema, Maksym
Format: Article
Language:English
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Summary:Phase-change memory (PCM) is an emerging memory technology based on the resistance contrast between the crystalline and amorphous states of a material. Further development and realization of PCM as a mainstream memory technology rely on innovative materials and inexpensive fabrication methods. Here, we propose a generalizable and scalable solution-processing approach to synthesize phase-change telluride inks in order to meet demands for high-throughput material screening, increased energy efficiency, and advanced device architectures. Bulk tellurides, such as Sb2Te3, GeTe, Sc2Te3, and TiTe2, are dissolved and purified to obtain inks of molecular metal telluride complexes. This allowed us to unlock a wide range of solution-processed ternary tellurides by the simple mixing of binary inks. We demonstrate accurate and quantitative composition control, including prototype materials (Ge–Sb–Te) and emerging rare-earth-metal telluride-doped materials (Sc–Sb–Te). Spin-coating and annealing convert ink formulations into high-quality, phase-pure telluride films with preferred orientation along the (00l) direction. Deposition engineering of liquid tellurides enables thickness-tunable films, infilling of nanoscale vias, and film preparation on flexible substrates. Finally, we demonstrate cyclable and non-volatile prototype memory devices, achieving performance indicators such as resistance contrast and low reset energy on par with state-of-the-art sputtered PCM layers.
ISSN:1936-0851
1936-086X
DOI:10.1021/acsnano.3c10312