Subtractive Patterning of Nanoscale Thin Films Using Acid‐Based Electrohydrodynamic‐Jet Printing

• Published in: Small methods 2024-05, Vol.8 (5), p.e2301407-n/a
• Main Authors: Cho, Tae H., Farjam, Nazanin, Barton, Kira, Dasgupta, Neil P.
• Format: Article
• Language: English
• Subjects: 3‐D printing; additive manufacturing; atomic layer deposition; printable devices; subtractive patterning
• ISSN: 2366-9608; 2366-9608
• DOI: 10.1002/smtd.202301407

As an alternative to traditional photolithography, printing processes are widely explored for the patterning of customizable devices. However, to date, the majority of high‐resolution printing processes for functional nanomaterials are additive in nature. To complement additive printing, there is a need for subtractive processes, where the printed ink results in material removal, rather than addition. In this study, a new subtractive patterning approach that uses electrohydrodynamic‐jet (e‐jet) printing of acid‐based inks to etch nanoscale zinc oxide (ZnO) thin films deposited using atomic layer deposition (ALD) is introduced. By tuning the printing parameters, the depth and linewidth of the subtracted features can be tuned, with a minimum linewidth of 11 µm and a tunable channel depth with ≈5 nm resolution. Furthermore, by tuning the ink composition, the volatility and viscosity of the ink can be adjusted, resulting in variable spreading and dissolution dynamics at the solution/film interface. In the future, acid‐based subtractive patterning using e‐jet printing can be used for rapid prototyping or customizable manufacturing of functional devices on a range of substrates with nanoscale precision. A subtractive patterning approach is introduced using electrohydrodynamic jet (e‐jet) printing, where the ink results in material removal, rather than addition. Hydrochloric acid is mixed with glycerol as the ink to pattern nanoscale ZnO thin films deposited using atomic layer deposition. By tuning the ink composition and printing parameters, the etching depth can be tuned with nanoscale precision.