Physical Vapor Deposition of Molecular Glass Photoresists: A New Route to Chemically Amplified Patterning

A negative tone photoresist film, consisting of a molecular glass, a photoacid generator, and an acid labile crosslinker, was prepared by physical vapor deposition, a solvent‐free process. Subsequent to deposition, the coevaporated monomers were exposed using 365 nm radiation, subjected to a post ex...

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Bibliographic Details
Published in:Advanced functional materials 2007-09, Vol.17 (14), p.2336-2342
Main Authors: Pfeiffer, F., Felix, N. M., Neuber, C., Ober, C. K., Schmidt, H.-W.
Format: Article
Language:English
Subjects:
Hybrid materials
Lithography
Patterning
Photoresists
Physical vapor deposition
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Summary:A negative tone photoresist film, consisting of a molecular glass, a photoacid generator, and an acid labile crosslinker, was prepared by physical vapor deposition, a solvent‐free process. Subsequent to deposition, the coevaporated monomers were exposed using 365 nm radiation, subjected to a post exposure bake step, and developed in aqueous base to produce sub‐micron patterns. Combinatorial techniques were used to aid optimization of the photoresist by systematic variations in composition and exposure dose. Development factors such as concentration and time were also optimized. A negative tone photoresist based on a molecular glass was prepared by physical vapor deposition. A combinatorial approach was utilized to aid optimization of the photoresist by systematic variations in compositions, exposure doses, and development conditions and thus the pattern formation.
ISSN:1616-301X
1616-3028
DOI:10.1002/adfm.200600717