An analytical model for negative bias temperature instability

Negative Bias Temperature Instability (NBTI) in PMOS transistors has become a significant reliability concern in present day digital circuit design. With continued scaling, the effect of NBTI has rapidly grown in prominence, forcing designers to resort to a pessimistic design style using guard-bandi...

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Bibliographic Details
Main Authors: Kumar, Sanjay V., Kim, Chris H., Sapatnekar, Sachin S.
Format: Conference Proceeding
Language:English
Subjects:
Hardware
Hardware > Hardware validation
Hardware > Integrated circuits > Logic circuits
Hardware > Integrated circuits > Logic circuits > Combinational circuits
Online Access:Get full text
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Summary:Negative Bias Temperature Instability (NBTI) in PMOS transistors has become a significant reliability concern in present day digital circuit design. With continued scaling, the effect of NBTI has rapidly grown in prominence, forcing designers to resort to a pessimistic design style using guard-banding. Since NBTI is strongly dependent on the time for which the PMOS device is stressed, different gates in a combinational circuit experience varying extents of delay degradation. This has necessitated a mechanism of quantizing the gate-delay degradation, to pave the way for improved design strategies. Our work addresses this issue by providing a procedure for determining the amount of delay degradation of a circuit due to NBTI. An analytical model for NBTI is derived using the framework of the Reaction-Diffusion model, and a mathematical proof for the widely observed phenomenon of frequency independence is provided. Simulations on ISCAS benchmarks under a 70nm technology show that NBTI causes a delay degradation of about 8% in combinational logic based circuits after 10 years ( 3 x 108s).
ISSN:1092-3152
DOI:10.1145/1233501.1233601