MOCVD of zirconium oxide thin films: Synthesis and characterization

• Published in: Applied surface science 2009-02, Vol.255 (9), p.4792-4795
• Main Authors: Torres-Huerta, A.M., Domínguez-Crespo, M.A., Ramírez-Meneses, E., Vargas-García, J.R.
• Format: Article
• Language: English
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; CVD; Exact sciences and technology; Physics; Thin films; ZrO 2
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/j.apsusc.2008.11.059

The synthesis of thin films of zirconia often produces tetragonal or cubic phases, which are stable at high temperatures, but that can be transformed into the monoclinic form by cooling. In the present study, we report the deposition of thin zirconium dioxide films by metalorganic chemical vapor deposition using zirconium (IV)-acetylacetonate as precursor. Colorless, porous, homogeneous and well adherent ZrO 2 thin films in the cubic phase were obtained within the temperature range going from 873 to 973 K. The deposits presented a preferential orientation towards the (1 1 1) and (2 2 0) planes as the substrate temperature was increased, and a crystal size ranging between 20 and 25 nm. The kinetics is believed to result from film growth involving the deposition and aggregation of nanosized primary particles produced during the CVD process. A mismatch between the experimental results obtained here and the thermodynamic prediction was found, which can be associated with the intrinsic nature of the nanostructured materials, which present a high density of interfaces.