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Low-Power and Compact Sequential Circuits With Independent-Gate FinFETs

Scaling of the standard single-gate bulk MOSFETs faces great challenges in the nanometer regime due to the severe short-channel effects that cause an exponential increase in the leakage current and enhanced sensitivity to process variations. Multi-gate MOSFET technologies mitigate these limitations...

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Bibliographic Details
Published in:IEEE transactions on electron devices 2008-01, Vol.55 (1), p.60-70
Main Authors: Tawfik, S.A., Kursun, V.
Format: Article
Language:English
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Summary:Scaling of the standard single-gate bulk MOSFETs faces great challenges in the nanometer regime due to the severe short-channel effects that cause an exponential increase in the leakage current and enhanced sensitivity to process variations. Multi-gate MOSFET technologies mitigate these limitations by providing a stronger control over a thin silicon body with multiple electrically coupled gates. Double-gate FinFET is the most attractive choice among the multi-gate transistor architectures because of the self-alignment of the two gates and the similarity of the fabrication steps to the existing standard CMOS technology. New latches and flip-flops based on independent-gate FinFETs are proposed in this paper to simultaneously reduce the power consumption and the circuit area. With the proposed independently biased double-gate FinFET sequential circuits, the active power consumption, the clock power, the leakage power, and the circuit area are reduced by up to 47%, 32%, 42%, and 20%, respectively, while maintaining similar speed and data stability as compared to the standard sequential circuits with tied-gate FinFETs in a 32-nm FinFET technology.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2007.911039