Inactivation of Staphylococcus aureus and Escherichia coli under various light sources on photocatalytic titanium dioxide thin film

Although photocatalytic TiO 2 thin film has been considered for antimicrobial applications and is sensitive to light sources, its inactivation mechanism under various light sources is relatively unknown. This work elucidates the mechanism by which photocatalytic TiO 2 thin film inactivates to Staphy...

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Bibliographic Details
Published in:Surface & coatings technology 2009-01, Vol.203 (8), p.1081-1085
Main Authors: Chung, Chi-Jen, Lin, Hsin-I, Chou, Chia-Man, Hsieh, Ping-Yen, Hsiao, Ching-Hung, Shi, Zhi-Yuan, He, Ju-Liang
Format: Article
Language:English
Subjects:
Antimicrobial
Arc ion plating
Cross-disciplinary physics: materials science
rheology
Escherichia coli
Exact sciences and technology
Inactivation
Light sources
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Photocatalytic
Physics
Staphylococcus aureus
Surface treatments
Titanium dioxide
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Summary:Although photocatalytic TiO 2 thin film has been considered for antimicrobial applications and is sensitive to light sources, its inactivation mechanism under various light sources is relatively unknown. This work elucidates the mechanism by which photocatalytic TiO 2 thin film inactivates to Staphylococcus aureus and Escherichia coli under various light sources using a bacterial cell culture and the microscopic observation of bacterial cells. Experimental results indicate that antimicrobial behavior can only be activated when the light source exhibits emissions with a threshold energy that exceeds the band gap energy of anatase TiO 2. The black light source with a stronger UV emission than the fluorescent lamp, is associated with an earlier bacterial growth inhibition phase. The bacterial inactivation mechanism of Staphylococcus aureus differs from that of Escherichia coli. The former suffers the detachment of the cell wall from cell membrane and the later undergoes a nucleoid pattern change from features of relaxation toward features of condensation.
ISSN:0257-8972
1879-3347
DOI:10.1016/j.surfcoat.2008.09.036