Fabrication and characterization of vacuum deposited fluorescein thin films

Simple vacuum evaporation technique for deposition of dyes on various solid surfaces has been developed. The method is compatible with conventional solvent-free nanofabrication processing enabling fabrication of nanoscale optoelectronic devices. Thin films of fluorescein were deposited on glass, flu...

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Bibliographic Details
Published in:Thin solid films 2011-03, Vol.519 (11), p.3835-3839
Main Authors: Jalkanen, Pasi, Kulju, Sampo, Arutyunov, Konstantin, Antila, Liisa, Myllyperkiö, Pasi, Ihalainen, Teemu, Kääriäinen, Tommi, Kääriäinen, Marja-Leena, Korppi-Tommola, Jouko
Format: Article
Language:English
Subjects:
Absorption
Aggregation
Applied sciences
Cross-disciplinary physics: materials science
rheology
Deposition
Electronics
Emission
Ethyl alcohol
Exact sciences and technology
Fluorescein
Glass
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Molecules
Nanoscale materials and structures: fabrication and characterization
Nanostructure
Optoelectronic devices
Other topics in nanoscale materials and structures
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Semiconductors
Thin films
Titanium dioxide
Vacuum deposition
Vapor phase epitaxy
growth from vapor phase
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Summary:Simple vacuum evaporation technique for deposition of dyes on various solid surfaces has been developed. The method is compatible with conventional solvent-free nanofabrication processing enabling fabrication of nanoscale optoelectronic devices. Thin films of fluorescein were deposited on glass, fluorine–tin–oxide (FTO) coated glass with and without atomically layer deposited (ALD) nanocrystalline 20nm thick anatase TiO2 coating. Surface topology, absorption and emission spectra of the films depend on their thickness and the material of supporting substrate. On a smooth glass surface the dye initially forms islands before merging into a uniform layer after 5 to 10 monolayers. On FTO covered glass the absorption spectra are similar to fluorescein solution in ethanol. Absorption spectra on ALD-TiO2 is red shifted compared to the film deposited on bare FTO. The corresponding emission spectra at λ=458nm excitation show various thickness and substrate dependent features, while the emission of films deposited on TiO2 is quenched due to the effective electron transfer to the semiconductor conduction band.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2011.01.238