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Mimicking Electrodeposition in the Gas Phase: A Programmable Concept for Selected-Area Fabrication of Multimaterial Nanostructures

An in situ gas‐phase process that produces charged streams of Au, Si, TiO2, ZnO, and Ge nanoparticles/clusters is reported together with a programmable concept for selected‐area assembly/printing of more than one material type. The gas‐phase process mimics solution electrodeposition whereby ions in...

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Bibliographic Details
Published in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2010-05, Vol.6 (10), p.1117-1124
Main Authors: Cole, Jesse J., Lin, En-Chiang, Barry, Chad R., Jacobs, Heiko O.
Format: Article
Language:English
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Summary:An in situ gas‐phase process that produces charged streams of Au, Si, TiO2, ZnO, and Ge nanoparticles/clusters is reported together with a programmable concept for selected‐area assembly/printing of more than one material type. The gas‐phase process mimics solution electrodeposition whereby ions in the liquid phase are replaced with charged clusters in the gas phase. The pressure range in which the analogy applies is discussed and it is demonstrated that particles can be plated into pores vertically (minimum resolution 60 nm) or laterally to form low‐resistivity (48 µΩ cm) interconnects. The process is applied to the formation of multimaterial nanoparticle films and sensors. The system works at atmospheric pressure and deposits material at room temperature onto electrically biased substrate regions. The combination of pumpless operation and parallel nozzle‐free deposition provides a scalable tool for printable flexible electronics and the capability to mix and match materials. Clusters of charged nanoparticles in the gas phase are selectively deposited onto electrically grounded surfaces. Similar to electroplating, the continued deposition of Au nanoparticles onto underlying traces increases the overall line conductivity. Alternatively, semiconducting ZnO and Ge nanomaterials can be sequentially deposited between interdigitated electrodes and serve as addressable sensor‐active areas.
ISSN:1613-6810
1613-6829
1613-6829
DOI:10.1002/smll.200901547