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Low temperature and controlled synthesis of Bi2(S1−xSex)3 thin films using a simple chemical route: effect of bath composition
Nanostructured bismuth sulphoselenide (Bi 2 (S 1− x Se x ) 3 ) thin films have been synthesized using a simple, cost-effective chemical bath deposition (CBD) method at room temperature (300 K). Structural, compositional, morphological and optical characterization and photoelectrochemical performance...
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Main Authors: | , , , , |
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Format: | Article |
Language: | English |
Online Access: | Get full text |
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Summary: | Nanostructured bismuth sulphoselenide (Bi
2
(S
1−
x
Se
x
)
3
) thin films have been synthesized using a simple, cost-effective chemical bath deposition (CBD) method at room temperature (300 K). Structural, compositional, morphological and optical characterization and photoelectrochemical performance testing of these Bi
2
(S
1−
x
Se
x
)
3
thin films has been carried out. The X-ray diffraction (XRD) study demonstrates that these thin films are nanocrystalline in nature with pure orthorhombic crystal structures. X-ray photoelectron spectroscopy (XPS) and energy dispersive X-ray spectroscopy (EDS) show that the deposited thin films are nearly stoichiometric in nature. Field emission scanning electron microscopy (FESEM) reveals different morphologies for the Bi
2
(S
1−
x
Se
x
)
3
thin films. The linear nature of the plots seen in the UV-Vis-NIR absorption study confirms the direct allowed type of transition.
J
-
V
measurements with a solar simulator were carried out for all samples and the highest photoconversion efficiency, 0.3845%, has been recorded for the Bi
2
Se
3
thin film. The significant boost in photoelectrochemical (PEC) performance might be due to the larger surface area with lower dislocation density and microstrain with a lower level of grain boundary resistance of Bi
2
Se
3
thin films.
Nanostructured Bi
2
(S
1−
x
Se
x
)
3
thin films were synthesized using a simple chemical bath deposition method at room temperature, and their photoelectrochemical performance was tested. |
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ISSN: | 2046-2069 |
DOI: | 10.1039/c5ra07372c |