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Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood. fundamentals, etching, deposition, and surface interactions /
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| Other Authors: | , , |
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| Format: | Book |
| Language: | English |
| Published: |
Park Ridge, N.J. :
Noyes Publications,
1990
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| Series: | Materials science and process technology series
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| Subjects: | |
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Pilkington Library
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Shelfmark:
621.3817/HAN |
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Copy [0400534150]
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