Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood. fundamentals, etching, deposition, and surface interactions /
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Other Authors: | , , |
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Format: | Book |
Language: | English |
Published: |
Park Ridge, N.J. :
Noyes Publications,
1990
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Series: | Materials science and process technology series
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Subjects: | |
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089 | |a 621.3817 | ||
089 | |a 667.9 | ||
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245 | 0 | 0 | |a Handbook of plasma processing technology : |b fundamentals, etching, deposition, and surface interactions / |c edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood. |
260 | |a Park Ridge, N.J. : |b Noyes Publications, |c 1990 | ||
490 | 0 | |a Materials science and process technology series | |
650 | 0 | 0 | |a Plasma engineering |
650 | 0 | 0 | |a Semiconductors |x Etching |
650 | 0 | 0 | |a Plasma etching |
700 | 1 | |a Rossnagel, Stephen M. | |
700 | 1 | |a Cuomo, Jerome J. | |
700 | 1 | |a Westwood, William Dickson | |
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