Proceedings, 34th Applied Imagery Pattern Recognition Workshop October 19-21, 2005, Washington, DC / sponsored by IEEE Computer Society Technical Committee on Pattern Analysis and Machine Intelligence ; presented by AIPR ; edited by Robert J. Bonneau. October 19-21, 2005, Washington, DC /

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Bibliographic Details
Corporate Authors: Applied Imagery Pattern Recognition Workshop Washington, D.C., IEEE Computer Society. Technical Committee on Pattern Analysis and Machine Intelligence
Other Authors: Bonneau, Robert J.
Format: eBook
Language:English
Published: [Piscataway, N.J.] : IEEE, c2006.
Subjects:
Optical pattern recognition > Congresses.
Image processing > Congresses.
Online Access:http://ieeexplore.ieee.org/servlet/opac?punumber=10735
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