Oxygen plasma cleaning of copper for photocathode applications: A MEIS and XPS study

MEIS and XPS studies have been conducted for a range of oxygen plasma treated copper samples (and one treated with Ar plasma), as part of a study of the preparation of photocathode surfaces. This procedure was seen to remove hydrocarbon contamination, but left an oxide film whose thickness depended...

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Bibliographic Details
Main Authors: TCQ Noakes, R Valizadeh, AN Hannah, LB Jones, BL Militsyn, Sonal Mistry, Michael Cropper, A Rossall, JA Van den Berg
Format: Default Article
Published: 2022
Subjects:
Medium energy ion scattering
XPS
Plasma cleaning
Photocathodes
Copper
Oxide
Online Access:https://hdl.handle.net/2134/21130159.v1
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