Dynamical model for the formation of patterned deposits at receding contact lines

We describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes. A dynamical model based on a long-wave approximation predicts the deposition of irregular and regular l...

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Bibliographic Details
Main Authors: Lubor Frastia, Andrew Archer, Uwe Thiele
Format: Default Article
Published: 2011
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Online Access:https://hdl.handle.net/2134/15356
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