Modelling of deposition processes on the TiO2 rutile (110) surface

Deposition of TixOy clusters onto the rutile TiO2 (1 1 0) surface has been modelled using empirical potential based molecular dynamics. Deposition energies in the range 10–40 eV have been considered so as to model typical deposition energies of magnetron sputtering. Defects formed as a function of b...

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Bibliographic Details
Main Authors: Louis J. Vernon, Roger Smith, Steven Kenny
Format: Default Article
Published: 2009
Subjects:
Geochemistry not elsewhere classified
Other mathematical sciences not elsewhere classified
Computer simulations
Molecular dynamics
Deposition
Titania
Film growth
Geochemistry
Mathematical Sciences not elsewhere classified
Online Access:https://hdl.handle.net/2134/11626
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