Orientationally textured thin films of WOx deposited by pulsed laser deposition

Pulsed laser deposition from a compound target in an oxygen atmosphere has been used to produce sub-stoichiometric WOx films of 30 nm thickness on Si(100) and SrTiO3(100) substrates. The growth temperature was 500 °C and the pressure of the O2 background was 2.5 × 10−2 mbar. The films have been asse...

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Bibliographic Details

Main Authors:	Andrew Caruana, Michael Cropper
Format:	Default Article
Published:	2014
Subjects:	Other physical sciences not elsewhere classified Pulsed laser deposition Thin film structure and morphology Tungsten trioxide X-ray diffraction Texture Physical Sciences not elsewhere classified
Online Access:	https://hdl.handle.net/2134/16458
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