Spontaneous growth of bismuth nanowires on a sputter-deposited thin bismuth film

Thin films of bismuth of thickness 100nm have been deposited onto Si(111) substrates held at 120°C using magnetron sputter deposition. The three-inch magnetrons were operated at DC powers between 30W and 50W to give deposition rates between 0.03 and 0.09nms-1. Examination of the surface of the thin...

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Bibliographic Details
Main Authors: Andrew Caruana, Michael Cropper, Steven A. Stanley
Format: Default Article
Published: 2015
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Online Access:https://hdl.handle.net/2134/17658
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