High rate reactive magnetron sputtering
Glow discharge sputtering has been used for many years to produce thin films but its commercial applications are severely limited by low deposit ion rates. The DC planar magnetron, developed a decade ago, allows much higher deposition rates and its commercial use has expanded rapidly. Non-reactive m...
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| Format: | Default Thesis |
| Published: |
1988
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| Online Access: | https://hdl.handle.net/2134/10464 |
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