Modification of the properties of D.C. magnetron sputtered magnetic thin films by self-bias
In this thesis a method to control the deposition process of D.C. magnetron sputtered magnetic thin films is described. A biased anode, situated in front of the magnetron, is used to alter the plasma characteristics which influence the film deposition process. The magnetic field configuration which...
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| Format: | Default Thesis |
| Published: |
1991
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| Online Access: | https://hdl.handle.net/2134/36439 |
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